Semiconductors Calcined clay A Multilayers Colloidal solution X-ray diffraction A-CNx A3 Physical vapor deposition processes Annealing Plasma etching CNTs’ collapse AuCu alloy Ambipolar material PECVD Scanning electron microscopy Carbon Nanotube CIGSe Band gap Nanotubes Magnetron sputtering Low-pressure plasma processing Applications industrielles B Chemical synthesis Anatase Adsorption Mott insulator Buffer Couple Carbon V2O3 Biofilms microbiens Plasmas froids 3 nm in size B3 Solar cells A1 Characterization Amyloid precursor Atomic layer etching Vanadium Sesquioxide Films Optical properties XPS Alloying Selenization Kirkendall effect Ablation laser B2 Semiconducting indium compounds Mass spectrometry Alzheimer's disease Sputtering A Chalcogenides A Thin films Amorphous Aluminium nitride Nanocomposite Etching NEXAFS Integrated optics BOMBARDMENT CaTiO3Pr^3^+ Titanium dioxide Transfert d'énergie Mott insulators Optical interferometry Residual stress Biomembranes Biomasse Capacitance AlN C Photoelectron spectroscopy Thin films Rutile SF 6 Non-volatile memory Physical vapor deposition TiO2 Aryl-diazonium salts Argon InP chlorine etching inductive coupled plasma ICP modeling plasma sheath simulation X-ray photoelectron spectroscopy Biocapteurs Resistive switching Structure Copper Transmission electron microscopy Oxides Bipolar resistive switching BRS TEM Chalcogenide CH4 B1 Inorganic compounds Optical waveguides Bixbyite Functionalization Atomic force microscopy Sol-gel Spectroscopic ellipsometry B2 Semiconducting alloys Avalanche breakdown CHLORINE PLASMAS AZO thin films B2 Quaternary Band alignment Thin film